Study of mechanical metallization parameters for ceramics: Tungsten Carbide and Silicon Nitride
mechanical metallization, tungsten carbide, silicon nitride.
In this work we evaluated the mechanical metallization parameters that maximize the quality of the Ti coating on the surface of the tungsten carbide and silicon nitride samples. for the measurements a Ti film was applied to the surface of the sample and characterized by SEM images, roughness and number of surface defects. In the samples of silicon nitride the parameters already established in the literature were satisfactory, in the case of samples of tungsten carbide the time of mechanical metallization had to be folded so that the metallized surface presented a regular coverage.